SPUTTER SYSTEM FOR DEPOSITION OF METALS AND METAL OXIDES. THIS SPUTTER IS CAPABLE OF RF AND DC SPUTTERING.
Award details are derived from public USAspending.gov records. Not a bid recommendation.
Award details
- Award ID
- 80NSSC23PA103
- Contractor
- Awarding agency
- National Aeronautics and Space Administration
- Sub-agency / office
- National Aeronautics and Space Administration
- Award amount
- $172,000
- Period of performance
- Nov 10, 2022 – Nov 9, 2023
- NAICS
- 333242 — Semiconductor Machinery Manufacturing
- PSC
- PSC 6695
Public award description
SPUTTER SYSTEM FOR DEPOSITION OF METALS AND METAL OXIDES. THIS SPUTTER IS CAPABLE OF RF AND DC SPUTTERING.
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