ION IMPLANTATION SERVICE, 4" DIAMETER WAFER, 14N, ENERGY: 1.8 MEV MAXIMUM, WILL USE N2 + AT 3.6 MEV, DYNAMI…

Award details are derived from public USAspending.gov records. Not a bid recommendation.

Award details

Award ID: NNC11VB51P
Contractor
Awarding agency: National Aeronautics and Space Administration
Sub-agency / office: National Aeronautics and Space Administration
Award amount: $0
Period of performance: Mar 3, 2011 – Mar 25, 2011
NAICS: 541712 — Research and Development in the Physical, Engineering, and Life Sciences
PSC: PSC 6850
Place of performance: NY

ION IMPLANTATION SERVICE, 4" DIAMETER WAFER, 14N, ENERGY: 1.8 MEV MAXIMUM, WILL USE N2 + AT 3.6 MEV, DYNAMITRON ACCELERATOR. DOSE: 1E17 IONS/CM2

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