Response deadline
Wed, Feb 11, 2026, 7:00 PM ESTSAM.gov listing
TECHNOLOGY LICENSING OPPORTUNITY: Electroplated Materials and Array Design for Scintillators
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Opportunity details
- NAICS
- 541715
- Notice type
- Special Notice
- Set-aside
- No Set aside used
- Original posted
- January 21, 2026
- Last updated
- October 19, 2026
- Notice ID
- 863eb8f9b4db4af5a9c982d45f33c9a7
Summary
Modern scintillator grids are essential to radiation detection systems that require high spatial resolution and fast response. However, current grid fabrication methods rely on hazardous chemical etching and produce inconsistent structures that limit performance, scalability, and safety. This capability addresses the limitations of current fabrication methods by eliminating hazardous chemical etching, improving uniformity, and enabling complex geometries at scale. Advantages Enables high-resolution grid fabrication from high-Z metals (e.g., Re, Au, Re/Ni) Avoids toxic and hazardous chemicals associated with traditional etching Supports scalable production of precision-aligned, high-Z scintillator arrays with low material loss Provides micron-level dimensional control and uniformity Compatible with multiple scintillator materials and array configurations, enabling customization for medical, industrial, and defense applications Adaptable to custom geometries for specialized imaging or detection applications Technology Description This technology enables the fabrication of dense, high-resolution scintillator grid arrays with micron-level precision, suitable for advanced radiation detection and imaging applications. The process works by electroplating high-Z metals, such as rhenium (Re), gold (Au), or their alloys, onto a substrate in the shape of the final grid geometry. These electro-formed components are then joined using hot isostatic pressing (HIP) at metal-specific temperatures and pressures to form solid bonded structures. Finally, the substrate is dissolved, leaving behind a free-standing, precision-aligned grid array. This approach eliminates chemical hazards, improves feature uniformity, and supports complex geometries, making it suitable for both small- and large-scale detector production. Market Applications This technology supports next-generation imaging and detection systems where high resolution, precision fabrication, and material efficiency are critical. This process can benefit: Fabricating CT, PET, and SPECT detector arrays for medical imaging Developing radiation detection systems for homeland security or military use Producing NDT imaging systems for aerospace and industrial inspection Supporting nuclear energy monitoring with compact, rugged detection grids Enabling advanced materials R&D for photonic and meta-material applications https://www.lanl.gov/engage/collaboration/feynman-center/tech-and-capability-search/electroplated-scintillators LANL Tech Partnerships: Unlock the Innovative Potential Los Alamos National Laboratory offers a wide range of cutting-edge technologies and capabilities that may provide your company with a competitive edge in the market and unlock the innovative potential that can enhance, refine, and revolutionize your products. LANL’s licensing program focuses on moving inventions developed by our researchers to commercial innovations. Patented and patent pending inventions and copyrighted software are available to existing and start-up companies through exclusive and non-exclusive licensing agreements. For specific discussions, please contact licensing@lanl.gov. Note: This is not a call for external services for the development of this technology. https://www.lanl.gov/engage/collaboration/feynman-center/partner-with-us/licensing-technology https://www.lanl.gov/engage/collaboration/feynman-center/tech-and-capability-search
Read Full Official Summary
Modern scintillator grids are essential to radiation detection systems that require high spatial resolution and fast response. However, current grid fabrication methods rely on hazardous chemical etching and produce inconsistent structures that limit performance, scalability, and safety. This capability addresses the limitations of current fabrication methods by eliminating hazardous chemical etching, improving uniformity, and enabling complex geometries at scale. Advantages Enables high-resolution grid fabrication from high-Z metals (e.g., Re, Au, Re/Ni) Avoids toxic and hazardous chemicals associated with traditional etching Supports scalable production of precision-aligned, high-Z scintillator arrays with low material loss Provides micron-level dimensional control and uniformity Compatible with multiple scintillator materials and array configurations, enabling customization for medical, industrial, and defense applications Adaptable to custom geometries for specialized imaging or detection applications Technology Description This technology enables the fabrication of dense, high-resolution scintillator grid arrays with micron-level precision, suitable for advanced radiation detection and imaging applications. The process works by electroplating high-Z metals, such as rhenium (Re), gold (Au), or their alloys, onto a substrate in the shape of the final grid geometry. These electro-formed components are then joined using hot isostatic pressing (HIP) at metal-specific temperatures and pressures to form solid bonded structures. Finally, the substrate is dissolved, leaving behind a free-standing, precision-aligned grid array. This approach eliminates chemical hazards, improves feature uniformity, and supports complex geometries, making it suitable for both small- and large-scale detector production. Market Applications This technology supports next-generation imaging and detection systems where high resolution, precision fabrication, and material efficiency are critical. This process can benefit: Fabricating CT, PET, and SPECT detector arrays for medical imaging Developing radiation detection systems for homeland security or military use Producing NDT imaging systems for aerospace and industrial inspection Supporting nuclear energy monitoring with compact, rugged detection grids Enabling advanced materials R&D for photonic and meta-material applications https://www.lanl.gov/engage/collaboration/feynman-center/tech-and-capability-search/electroplated-scintillators LANL Tech Partnerships: Unlock the Innovative Potential Los Alamos National Laboratory offers a wide range of cutting-edge technologies and capabilities that may provide your company with a competitive edge in the market and unlock the innovative potential that can enhance, refine, and revolutionize your products. LANL’s licensing program focuses on moving inventions developed by our researchers to commercial innovations. Patented and patent pending inventions and copyrighted software are available to existing and start-up companies through exclusive and non-exclusive licensing agreements. For specific discussions, please contact licensing@lanl.gov. Note: This is not a call for external services for the development of this technology. https://www.lanl.gov/engage/collaboration/feynman-center/partner-with-us/licensing-technology https://www.lanl.gov/engage/collaboration/feynman-center/tech-and-capability-search
Related Federal Opportunities
Why this matters
- This notice is a special notice.
- The listed response deadline is Feb 11, 2026.
- 4 related opportunities share this NAICS.
Related federal terms
Market context
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