High Performance Computing for Rapid Design and Optimization of Roll-to-Roll Etch Processes

Despite its potential to lower costs and increase throughput, roll-to-roll nanomanufacturing has yet to become widely used by the private sector due to a lack of industry standardization and the dearth of available data on roll-to-roll process limits- To address this knowledge gap and increase roll-to-roll adoption, a high-performance computing simulation tool will be developed- This tool will provide the means for current and potential roll-to-roll industry players to inexpensively and rapidly scale- up, design, and optimize their roll-to-roll plasma etch equipment- The proposed simulation tool will use high performance computing to create a virtual environment for its users to simulate roll-to-roll plasma etch processes- It will be integrated with proprietary technology to enable rapid process predictions, and in turn, eliminate the high development and startup costs currently required to make the switch to roll-to-roll processing-