SBIR Phase I: Activation and Mobility Profiling for III-V Semiconductor Materials
Award amount
$149,994Program and phase
SBIR · Phase IAward year
2015Award details
- Awarding agency
- National Science Foundation
- Branch
- Not reported
- Recipient company
- ACTIVE LAYER PARAMETRICS, INC.
- Proposal award date
- 2015-07-01
- Contract end date
- 2015-12-31
- UEI
- PKF2JXVR2SP3
- Solicitation number
- Not reported
- Topic code
- S
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- SBIR Phase I: Differential resistance method to profile 3D semiconductor structures
- SBIR Phase II: Activation and Mobility Profiling for High-mobility Semiconductor Materials
Research funding history
3 SBIR/STTR records share this UEI (2015–2019). Reported award amounts total $1,124,980. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: National Science Foundation