Non-Invasive Bunch Length Monitor

It is extremely important to understand and control the temporal characteristics of electron beams at accelerator photoinjectors. Measuring and setting the electron bunch length is critical to the operation of the accelerator, and can ultimately determine if physics experiments at user-based accelerators can be successfully performed. Many parameters affect the temporal characteristics of electron bunches at the photoinjector including the drive laser optical pulse, the photogun bias voltage, beam current and bunch charge, the field strength of focusing magnets and phase and field strength of RF bunching and accelerating cavities. Optimizing these parameters can be a time consuming process, particularly during accelerator commissioning. Electrodynamic has developed a new beam monitor technology that is providing the CEBAF control room a real-time, non-invasive, measure of electron bunch shape at the photoinjector. A beam monitor system was installed on CEBAF during Phase I during its 12 GeV upgrade. As CEBAF turns back this new, real-time diagnostic of bunch shape and bunch length is available to the control room for its re-commissioning. This new technology also has potential applications in fast kicking and bunch shaping when actively driven by external RF. Future accelerator designs require advances in fast kicking technology. Electrodynamic has developed experimental hardware and software in Phase I that will enable fast-kicking and bunch shaping experiments to commence in Phase II. At the successful completion of Phase II, Electrodynamic will have equipped JLAB with beam monitors, a MEIC 1:10 prototype bunch kicker, and a new photogun. The successful completion of these efforts will develop these new technologies into products, putting Electrodynamic in an ideal position to market them worldwide.