SBIR/STTR Research Award

Technologies for Nanoscale Imaging Using Coherent Extreme Ultraviolet and Soft X-Ray Light

Award identifier a9b450870700f7646a8444132328743af7ac13a522c63b252c94695a9a200c8aAwarding agency Department of Defense

Award amount

$749,694

Program and phase

STTR · Phase II

Award year

2014

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Award details

Awarding agency
Department of Defense
Branch
Not reported
Recipient company
KAPTEYN-MURNANE LABORATORIES, INC
Proposal award date
2014-04-01
Contract end date
2016-03-31
UEI
TJNCNAL37AA5
Solicitation number
2011.0
Topic code
AF11-BT11

Research abstract

ABSTRACT: Microscopy is a critical enabling technology for advancing our understanding of nature. Imaging nano-scale objects with light in the extreme ultraviolet (EUV) and soft x-ray regions of the spectrum has advantages over visible light for several reasons including: resolution, elemental specificity, and the ability to image internal structures. Coherent diffractive imaging (CDI) has been developed as a tool to circumvent the limitations of currently available x-ray optics. In recent years CDI has shown very high, near-wavelength resolution when used with EUV light from high harmonic up-conversion from ultrafast lasers. We propose to develop a complete tabletop EUV microscope instrument that is tunable in wavelength from 30 to 2.5nm (40 to 500 eV). The key to creating a practical instrument will be developing a driving laser that is specifically tailored to high harmonic generation and is phase matched over this entire wavelength range, while requiring little alignment and maintenance. In Phase II we will continue our Phase I effort by designing an ultrashort amplifier based on Cr:YAG for the fiber laser developed in Phase I. Together, these technologies constitute a microscope with broad application in basic research, materials studies, lithography and medicine. BENEFIT: The microscope developed under this program will have broad application in basic research, materials studies, lithography and medicine. It will have the capability to perform actinic mask inspection for semiconductor lithography at 13.5nm. The ability to image thick samples and the inherent elemental contrast of the "water-window" region of the x-ray spectrum, will allow this microscope to image whole unstained cells without the need for sectioning with a resolution of 10nm or better. This microscope and its necessary driving technologies should find broad commercial market in addition to the DoD needs for nano-materials identification and battlefield medicine.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

53 SBIR/STTR records share this UEI (2002–2025). Reported award amounts total $23,088,637. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Energy, Department of Defense, National Science Foundation, Department of Commerce

Agency intelligence

Department of Defense

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