Scalable Nanophotonics Using Jet and Flash Imprint Lithography

Roll to Roll (R2R) printing, or web printing involves the patterning of flexible materials such as plastics or metal foils. R2R processing is in use today by industry and many R2R processes already exist for etch and deposition. However R2R patterning of arbitrary patterns with thin residual layer control at the nanoscale is far more challenging, particularly at a cost structure suited for commodity applications. If successful, the potential applications include flexible displays, and many types of nanophotonic devices including wire grid polarizers, and solar devices. The challenge, as always, is to create a process that is scalable and meets defectivity, throughput and cost of ownership requirements. In Phase II we propose the fabrication of a R2R tool using Jet and Flash Imprint Lithography (J-FIL). The J-FIL method of imprinting offers many advantages over thermal and ultraviolet imprinting including the elimination of resist waste (through inkjet dispensing), high throughput as a result of operating at room temperature and using low viscosity resists, and long mask life. These attributes make J-FIL attractive for both commercial and military applications. If successful, this program will result in the fabrication of a high throughput system capable of manufacturing any type of nanoscale photonic device.