SBIR/STTR Research Award

Topography Improvements in MEMS DMs for High-contrast, High-resolution Imaging

Award identifier a00f33050a5cd178376ce2a38413be208edec5ebdcd37030f0d77c016adc6d58Awarding agency National Aeronautics and Space Administration

Award amount

$699,410

Program and phase

SBIR · Phase II

Award year

2013

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Award details

Awarding agency
National Aeronautics and Space Administration
Branch
Not reported
Recipient company
Boston Micromachines Corporation
Proposal award date
2012-12-21
Contract end date
2015-03-20
UEI
SM8TM1GMFMY9
Solicitation number
Not reported
Topic code
S2.02

Research abstract

We propose to develop a 3064 actuator, continuous facesheet MEMS deformable mirror using a modified fabrication process that will eliminate mid-spatial frequency surface figure errors resulting from actuator "print-through" topography and stress-induced mirror scallop topography. These figure errors, which occur at spatial frequencies outside the DM control band, are the most significant technological development hurdle preventing the use of MEMS DMs in proximity glare suppression for astronomical coronagraphy. Such wavefront control devices fill a critical technology gap in NASA's vision for high-contrast, high-resolution space based imaging and spectroscopy instruments. Space-based telescopes have become indispensible in advancing the frontiers of astrophysics. Over the past decade NASA has pioneered coronagraphic instrument concepts and test beds to provide a foundation for exploring feasibility of new approaches to high-contrast imaging. From this work, NASA has identified a current technology need for compact, ultra-precise, multi-thousand actuator DM devices. Boston Micromachines Corporation has developed MEMS DMs that represents the state-of-the-art for scalable, small-stroke high-precision wavefront control. The emerging class of high-resolution DMs pioneered by the project team has already been shown to be compact, low-power, precise, and repeatable. These DMs can be currently produced with uncorrectable shape errors as small as 10nm root mean square (rms). The residual shape errors on the DM are mostly periodic and act essentially as a grating, producing diffraction spikes in the image plane. In the Phase I effort, DM fabrication process modifications were developed which will enable the manufacture of these enabling components with an unprecedented surface figure of less than 2nm rms by eliminating surface features resulting from print-through , etch access holes, and mirror attachment posts, and compensating for residual stress induced scalloping.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

38 SBIR/STTR records share this UEI (1999–2024). Reported award amounts total $15,546,351. Reported amounts are not federal obligations.

Phases: Phase II, Phase I

Agencies: National Aeronautics and Space Administration, Department of Defense, Department of Health and Human Services, National Science Foundation

Agency intelligence

National Aeronautics and Space Administration

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