SBIR/STTR Research Award
Producibility of Gallium Nitride Semiconductor Materials
Award amount
$100,000Program and phase
STTR · Phase IAward year
2010Award details
- Awarding agency
- Department of Defense
- Branch
- Missile Defense Agency
- Recipient company
- Inlustra Technologies LLC
- Proposal award date
- 2010-05-03
- Contract end date
- 2010-11-02
- UEI
- Not reported
- Solicitation number
- 2009.B
- Topic code
- MDA09-T001
Research abstract
Inlustra Technologies and the University of Notre Dame propose a Phase I STTR program that, combined with a subsequent Phase II effort, will result in methods for the scalable production of semi-insulating non-polar GaN substrates. These substrates will be utilized in the fabrication of high-power/high-frequency AlGaN-GaN electronic devices capable of reliable operation under high thermal load. In Phase I, Inlustra will demonstrate the feasibility of reproducible doping conditions needed for the growth of semi-insulating non-polar (a-plane and m-plane) GaN boules. Concurrently, Notre Dame will perform detailed electrical characterization (for example, temperature-dependent Hall measurements) of Inlustra’s semi-insulating GaN material. These measurements will provide frequent feedback required for Inlustra’s GaN boule growth effort. The proposed program will lay a solid foundation for further work in Phase II, focusing on commercially practical growth of semi-insulating GaN boules and benefits for (Al,Ga)N high-power/high-frequency devices.
Technology keywords
Not reported
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- AlInN/GaN HFET over Free-Standing bulk GaN substrates
- Producibility of Gallium Nitride Semiconductor Materials
- AlInN/GaN HFET over Free-Standing bulk GaN substrates
- Contamination-free, Ultra-rapid Reactive Chemical Mechanical Polishing (RCMP) of GaN substrates
- In-Situ Monitoring during HVPE for the Producibility of Semi-Insulating GaN