SBIR/STTR Research Award

Producibility of Gallium Nitride Semiconductor Materials

Award identifier 31388d496deb7058449a6b571aede16b95859b8aa63704db2b1fca8484e39efbAwarding agency Department of Defense · Missile Defense Agency

Award amount

$100,000

Program and phase

STTR · Phase I

Award year

2010

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Inlustra Technologies LLC
Proposal award date
2010-05-03
Contract end date
2010-11-02
UEI
Not reported
Solicitation number
2009.B
Topic code
MDA09-T001

Research abstract

Inlustra Technologies and the University of Notre Dame propose a Phase I STTR program that, combined with a subsequent Phase II effort, will result in methods for the scalable production of semi-insulating non-polar GaN substrates. These substrates will be utilized in the fabrication of high-power/high-frequency AlGaN-GaN electronic devices capable of reliable operation under high thermal load. In Phase I, Inlustra will demonstrate the feasibility of reproducible doping conditions needed for the growth of semi-insulating non-polar (a-plane and m-plane) GaN boules. Concurrently, Notre Dame will perform detailed electrical characterization (for example, temperature-dependent Hall measurements) of Inlustra’s semi-insulating GaN material. These measurements will provide frequent feedback required for Inlustra’s GaN boule growth effort. The proposed program will lay a solid foundation for further work in Phase II, focusing on commercially practical growth of semi-insulating GaN boules and benefits for (Al,Ga)N high-power/high-frequency devices.

Technology keywords

Not reported

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Agency intelligence

Department of Defense

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