Development of Nanoelectronic Materials and Devices, Based on Novel Metal-Oxide Interfaces
Award amount
$99,993Program and phase
STTR · Phase IAward year
2009Award details
- Awarding agency
- Department of Defense
- Branch
- Air Force
- Recipient company
- NEOCERA, LLC
- Proposal award date
- 2009-04-15
- Contract end date
- 2010-01-15
- UEI
- RGN2BNEVNG73
- Solicitation number
- 2008.B
- Topic code
- AF08-BT22
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- SBIR Phase II: Fault Isolation of Open Circuits in Semiconductor Products using Magnetic Current Imaging
- Development of Epitaxial GaN Films for RF Communications
- SBIR Phase I: Fault Isolation of Open Circuits in Semiconductor Products using Magnetic Current Imaging
- Superconducting Current Leads for Cryogenic Systems
- STTR Phase I: Scanning Magnetic Microscope using a Ferromagnetic Flux-Guide Coupled to a SQUID for Nanoscale Current Imaging of Integrated Circuits
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Fabrication Technology for Oxide Film Heterostructure Devices
- Fabrication Technology for Oxide Film Heterostructure Devices
- Digital Beam Processing of Oxide Nano-electronic Devices (Digi-POND)
Research funding history
43 SBIR/STTR records share this UEI (1989–2009). Reported award amounts total $7,573,684. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Defense, National Aeronautics and Space Administration, National Science Foundation, Department of Commerce, Department of Energy