SBIR/STTR Research Award

Development of Low Stress Ohmic Contacts to HgCdTe

Award identifier 5f8e86b1e2df1b464d6b2a5ce5dd10ffe19e3079a4645efeb1ef2816284b1a68Awarding agency Department of Defense · Army

Award amount

$729,986

Program and phase

SBIR · Phase II

Award year

2006

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Award details

Awarding agency
Department of Defense
Branch
Army
Recipient company
PHOTRONIX
Proposal award date
2006-09-22
Contract end date
2008-09-22
UEI
Not reported
Solicitation number
2005.2
Topic code
A05-099

Research abstract

During the proposed Phase II effort we will manufacture novel ohmic contacts and measure the stress in the ohmic contacts by several methods. We will thermally cycle the ohmic contacts and look for nucleated dislocations as a measure of induced stress. We will also coordinate our work with Professor Enrico Bellotti from Boston University who is an expert at computer modeling of physical phenomena. He will model the strain field in the crystal and will make predictions of how the strain field will interact and affect the electrical properties. We will use CTLMs to measure specific contact resistance. We will measure the ohmics at room temperature and at cryogenic temperatures. We will bump-bond the CTLM patterns to fan-out boards and make measurements in a standard dewar at cryogenic temperatures. Supporting Photronix in this effort is BAE SYSTEMS. BAE SYSTEMS has agreed to donate longwave LPE infrared double layer material as well as full use of its extensive infrared processing facility. Finally, BAE SYSTEMS will make available Read Out Integrated Circuits. The ROICs are needed so we can prove our novel technology by fabricating Focal Plane Arrays with our new ohmic contact technology while using BAE Systems extensive IR processing facilities.

Technology keywords

Not reported

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Agency intelligence

Department of Defense

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