SBIR/STTR Research Award

Rapid Damage-Free Shaping of Lightweight SiC Using Reactive Atom Plasma (RAP) Processing

Award identifier b3d5c6788439da0f1732bf9864b148e330c79c5b03221119649169509e8af5d4Awarding agency National Aeronautics and Space Administration

Award amount

$50,000

Program and phase

SBIR · Phase II

Award year

2006

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Award details

Awarding agency
National Aeronautics and Space Administration
Branch
Not reported
Recipient company
RAPT Industries, Inc.
Proposal award date
2005-12-02
Contract end date
2007-11-30
UEI
Not reported
Solicitation number
Not reported
Topic code
S2.04

Research abstract

The proposed Phase II effort seeks to demonstrate a dramatic reduction of the manufacturing cost and cycle time of lightweight silicon carbide mirrors by substituting a novel reactive atom plasma (RAP) process for traditional hard tool grinding and lapping. We will use the RAP process (a plasma-based non-contact shaping tool) along with conventional steps to shape a series of lightweight optics, culminating in a 12" asphere. We will finish these optics to final specification using one of several candidate sub-aperture finishing tools. The avoidance of surface and subsurface damage by the use of this non-contact RAP process is expected to substantially reduce the time and cost of optical finishing of lightweight SiC optics. We will also demonstrate the scalability of the RAP process for SiC optics and optical segments up to 2 meters.

Technology keywords

Not reported

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Agency intelligence

National Aeronautics and Space Administration

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