SBIR/STTR Research Award
SURFACE NITRIDE/CARBIDE MODIFICATION AT ATMOSPHERIC PRESSURE EMPLOYING WIDE AREA DISCHARGES
Award amount
$99,984Program and phase
STTR · Phase IAward year
2005Award details
- Awarding agency
- Department of Defense
- Branch
- Air Force
- Recipient company
- Cym Scientific
- Proposal award date
- 2005-08-01
- Contract end date
- 2006-05-01
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- AF05-T028
Research abstract
This proposal seeks modification, functionalization, and coating of surfaces at temperatures <300°C using RF-excited non-equilibrium atmospheric pressure slot plasmas 30-100 cm long. This wide-area and spatially uniform source offers many advantages compared to corona or dielectric barrier discharges. It operates at voltages of 150 V (and up) and is capable of 103-106 higher current densities, forming a unique plasma environment rich in free radicals and UV photons. Low voltage allows safer operation while offering controllable E/N conditions at high pressure for high throughput. This technology has already operated at 30 cm lengths and will be extended in the proposed work to meter lengths. Electrodes can be configured in complex shapes and curvatures to treat both inner and outer surfaces. Demonstration vehicles in Phase I include deposition of Ti, its carbide (TiC), and its nitride (TiN), and controlled surface modification of polymers. Composition, structure, adhesion, and wear resistance of these films will be characterized and compared to coatings from conventional means. This research will provide new means to satisfy Air Force coating requirements in the near-term, provide a valuable capability to the aerospace industry, and be transferable to related industries such as disk drive, flat-panel, architectural glass, and optical storage manufacturing.
Technology keywords
Not reported
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Material Surface Properties Modifications by Nonequilibrium Atmospheric Pressure Plasma Processing
- A Novel Atmospheric Pressure Plasma Chemical Vapor Deposition process for producing RMI/EFI coatings
- Material Surface Properties Modifications by Nonequilibrium Atmospheric Pressure Plasma Processing
- Material Surface Properties Modifications by Nonequilibrium Atmospheric Pressure Plasma Processing