Two Nested Plasma Antennas and Two Stacked Plasma Antenna Arrays at VHF/UHF and HF/VHF Antenna Arrays at VHF/UHF and HF/VHF

The Haleakala Research & Development Inc. will develop and analyze two plasma antennas in which the higher frequency VHF/UHF is nested inside the lower frequency HF/VHF antenna or a VHF/UHF plasma antenna array stacked with a HF/VHF plasma antenna array in which the higher frequency plasma antenna array propagates through the lower frequency plasma antenna array. This effort will support the PEO Ammunition Acquisition Program. We can do this with plasma but not with metal because of the properties of plasma physics. Because of the properties of plasma physics high gain and aperture can be achieved above and beyond that of a metal antenna of the same size by matching the plasma frequency to the antenna operating frequency of the antenna. By nesting and stacking the plasma antennas we can achieve high power, high bandwidth, and compactness. Our nested plasma antenna design will a minimum gain of 12 dBi over as wide a frequency band at HF/VHF with a maximum size of 2 meters in diameter and 3 meters in length ) and another similar antenna at VHF/UHF with a maximum size of 1.2 meters in diameter and 2 meters long.