Halo-hydrocarbon Growth of Bulk SiC

We propose to use a gas fed vertical style sublimation reactor that can accomodate several different types of chemistries and be modified to a number of different approaches. The reactor is similar to the HTCVD reactor developed by Linköping University and Okmetic. The approach will be to initially try out different chemistries at fairly high temperatures where sublimation is a dominant process. By studying the gas phase nucleation a high degree of understanding can be derived and a moderate temperature process can be developed. Using the knowledge from these experiments and from similar experiments conducted in a CVD reactor, a low temperature CVD approach will be developed with no thermal gradient. It is believed that a growth rate of at least 300 micrometer/h can be achieved at modest temperatures around 1500 - 1600C using the correct chemistry. The main issue is to be able to transport the material to the wafer with a minimum of parasitic processes and deposit the material on the wafer in a uniform and orderly fashion. The level of success is greatly increased since both a sublimation approach and a CVD approach will be tried and compared against each other.