SBIR/STTR Research Award
In-situ, Real-Time Process Characterization and Control in Nanoimprint Lithography and In-Situ Template Cleaning
Award amount
$98,905Program and phase
SBIR · Phase IAward year
2004Award details
- Awarding agency
- Department of Defense
- Branch
- Defense Advanced Research Projects Agency
- Recipient company
- Nanonex Corporation
- Proposal award date
- 2004-05-18
- Contract end date
- 2005-01-20
- UEI
- Not reported
- Solicitation number
- 2004.1
- Topic code
- SB041-030
Research abstract
The goal of the project is to (a) further develop an innovative in-situ real-time characterization tool for nanoimprint lithography (NIL) processes and (b) in-situ template cleaning using a laser beam. The characterization tool is based on real-time diffractive scatterometry and can measure many important imprint parameters (e.g. imprint depth, imprint speed, the resist deformations, etc) in-situ and real time. The tool can uniquely and significantly enhance the performance and yields of NIL. The innovative method is based on some recent developments at Prof. Chou's group and licensed to Nanonex Corporation.
Technology keywords
Not reported
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Chemical Nano-Imprint Lithography
- Chemical Nano-Imprint Lithography
- Lithography Support Technologies - Scattering of CaF2