SBIR/STTR Research Award

Rapid Automated Parallel Placement and Integration of Thin Film Semiconductor Epitaxial Liftoff Devices onto Host Substrates

Award identifier 523e0958273b49b9aef0c9401b32d5ecc81f526209a248f70be79f2eac13d87fAwarding agency Department of Defense · Army

Award amount

$735,490

Program and phase

SBIR · Phase II

Award year

1997

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Award details

Awarding agency
Department of Defense
Branch
Army
Recipient company
ELO TECHNOLOGIES, INC.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

The objective of this effort is to develop processes, materials, and equipment which will allow automated, high speed placement of thin film semiconductor devices onto host substrates. Such host substrates will consist of integrated circuits, multichip modules, and others. Recent technological achievements have made possible the seperation of active semiconductor thin films from their substartes. This process known as Epitaxial Liftoff (ELO) provides for the integration of active semiconductor films with other materials or with other semiconductor drivers. A process ecently developed allows for the automated transfer of these semiconductor films to any host substrate using readily available materials and equipment from the semiconductor packaging industry. This process transfers the ELO film onto a carrier and then places and bonds the films onto the host substrate. This method will allow for the automated, highly precise placement of up to hundreds of thousands of semiconductor devices onto a host substrate in parrellel. The benefits of this proposal include the design, production and distribution of high speed, automated equipment for the selective bonding of Epitaxial Liftoff circuits onto host substrates. Applications for products resulting from such research include both high specification and commercial products.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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