SBIR/STTR Research Award

Plasma Deposited, Photo-Oxidated Organosilicon Polymer to Produce Etch-Free, On-Chip, Low Loss Optical Waveguides

Award identifier b659af3f58579bd5285bbbffbc464972e763b51202b573e9785ce947cf74c2e8Awarding agency Department of Defense · Missile Defense Agency

Award amount

$700,000

Program and phase

SBIR · Phase II

Award year

2001

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
IONIC SYSTEMS, INC.
Proposal award date
Not reported
Contract end date
Not reported
UEI
CQXEUQJCKB59
Solicitation number
Not reported
Topic code
Not reported

Research abstract

In Phase I of this program, we proposed, and demonstrated a novel method for producing low loss on chip waveguides without etching. We propose, in Phase II, to focus on the materials unique optical properties, that is, not only a brad range of asdeposited index of refraction but the ability to be processed to given specific values in plane with refraction but the ability to be processed to given specific values in plane with photoexposure. In Phase I we were able to produce materials which hadindex changes of over 1.0 after exposure. In Phase I we were able to produce materials which had index changes of over 1.0 after exposure. In Phase II we will attempt to double this range. We will complete material characterization, including long termstability, and process optimization begun in Phase I. We will combine our material/process with innovative lithographic techniques to economically produce structures with design specific index of refraction. We will produce prototype phased arraydevices for high density wavelength division multiplexing. In addition to optimizing conventional designs, we will investigate embedding micro-optical components which would, for example, provide compensation for polarization mode losses. Phase II willconclude with the development of high volume production capable material and process as well as the prototyping and testing of initial devices. The success of the Phase II program will result in commercialization of photonic devices that capitalize on thesmaller device size, a 20X advantage, to either produce devices of equal area with 20X more functionality (20X the number of channels in a demultiplexer for example) or produce equivalent devices with 1/20 the capital expenditure and at least 80% less thancurrent prices. Additional competitive advantages results from the elimination of propagation losses with etch free produced waveguides and, reduction of polarization dependent loss in planar waveguide devices by at least an order of magnitude (providinga 10X increase in performance). We will use these advantages to secure at least 10% of the projected multi-billion dollar planar waveguide device market.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

21 SBIR/STTR records share this UEI (1995–2009). Reported award amounts total $4,311,398. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation, Department of Energy

Agency intelligence

Department of Defense

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