SBIR/STTR Research Award

SBIR Phase I: Electrophotographic Patterning of Flexible Backplanes

Award identifier fabcc18a17cd82ddb2b5a6d815497458b8a884a8672334769434639c3b3d27a1Awarding agency National Science Foundation

Award amount

$99,950

Program and phase

SBIR · Phase I

Award year

2003

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Visible Tech-knowledgy
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

This Small Business Innovation Research (SBIR) Phase I Project proposes to develop a novel process for manufacturing flexible active matrix backplanes on plastic substrates. The backplane consists of individual amorphous silicon thin-film transistors (TFTs) in a matrix grid pattern fabricated on a thin sheet of plastic. The proposed process will use electrographic printing methods (laser printing) to replace conventional photolithography. The backplanes will be fabricated using techniques such as plasma enhanced chemical vapor deposition and electrophotograhic patterning. The significance of this innovation is that it will reduce the number of processing steps compared to photolithography, lower manufacturing costs, and be compatible with future roll-to-roll manufacturing. The final goal will be to fabricate a working display based on these technologies using a polymer dispersed liquid-crystal medium. Commercially the backplanes are used to control both electrophoretic and liquid- crystal displays as part of a radio frequency identification (RFID) label. The commercial applications for the backplane/RFID label include retail electronic shelf labels, airline security luggage tags, and dynamic camouflaging. The total market size is estimated at $33 billion annually, with $13 billion in the United States and $20 billion internationally.

Technology keywords

Not reported

Agency intelligence

National Science Foundation

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