SBIR/STTR Research Award
HIGH RESISTIVITY SPIN-ON COATING FOR THIN FILM RESISTORS
Award amount
$460,000Program and phase
SBIR · Phase IIAward year
1990Award details
- Awarding agency
- Department of Defense
- Branch
- Missile Defense Agency
- Recipient company
- Brewer Science Incorporated
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- NHFTH4C223Q3
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
RECENT ADVANCES IN THE AREA OF SEMICONDUCTING POLYMERS HAVE MADE AVAILABLE A NEW CLASS OF MATERIALS WHICH HAVE CONDUCTIVITIES IN THE PROPER RANGE FOR SYNAPTIC CONNECTIONS FOR NEURAL NETWORKS. THIS STUDY WILL INVESTIGATE THIS TECHNOLOGY IN FOUR TASKS: DETERMINATION OF SPIN-COATING PARAMETERS, MEASUREMENT OF ELECTRICAL PROPERTIES, EVALUATIONOF STABILITY AND REPRODUCIBILITY, AND FABRICATION AND TESTING OF SMALL-GEOMETRY RESISTORS REPRESENTING THE SYNAPTIC CONNECTIONS. THE GOAL OF THE PROJECT IS TO DETERMINE THE UTILITY OF THIS CLASS OF POLYMERS FOR NEURAL NETWORK APPLICATIONS AND TO EVALUATE THEIR PROPERTIES FOR MORE GENERAL APPLICATIONS IN MICROELECTRONICS. THE AVAILABILITY OF A STABLE AND REPRODUCIBLE MATERIAL WITH A RESISTIVITY OF ABOUT 100KOHMS/CM**2 IS A PROBLEM FOR NEURAL NETWORKS AS WELL AS ANY SMALL-GEOMETRY ANALOG CIRCUITRY. A SPIN-COATABLE THIN FILM RESISTIVE MATERIAL WOULD FILL A GENERAL NEED IN THE INTEGRATED CIRCUIT INDUSTRY.
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- STTR Phase II: Flexible and Extended Range Radio Frequency Identification Tags
- Materials and Processing System for the Economic Production of Single-Wall Carbon Nanotube Thin-Film Transistors
- STTR Phase I: Development of High-Speed Infrared-Transparent Flexible Transistors Using Electronic-Grade Carbon Nanotube Solutions
- SBIR Phase I: Bottom Anti-Reflective Coatings - BARCs - for Production of Advanced Semiconductor Devices by 157 nm Lithography
- Novel Wet Developable Materials for DUV Lithography