High Gain, Fast Scan, Broad Spectrum, Parallel Beam Wavelength Dispersive X-Ray Spectrometer for SEM

70158 Many materials science investigations require the use of an x-ray spectrometer with Scanning Electron Microscopy (SEM) that has high resolution, high sensitivity for low energy x-rays, and high count rate ability. The instrument also must be able to scan quickly for fast identification of thin film layers, particulate identification, and semiconductor defect analysis. Such a spectrometer must be capable of covering the energy range associated with most thin film applications (100-5000eV), be comparable in cost to conventional systems, and be easily mountable on most SEM systems. This project will combine advanced x-ray collimation optics that cover an extended x-ray energy range with a fast scanning Parallel Beam Spectrometer. The development of this spectrometer will be based on a previous development of a Low Energy X-ray Spectrometer that covers a more limited 100-2400 eV range. Collimation optics for this spectrometer will consist of nested two reflection grazing incidence x-ray reflecting shells. Phase I will design the advanced x-ray collimation optics to cover the extended range, develop the techniques for fabricating these optics, and design the spectrometer that will be built in Phase II. Commercial Applications and Other Benefits as described by the awardee: The spectrometer should be applicable for analysis of thin films for optical and semiconductor devices, and the analysis of defects found on semiconductor micro-features.