Epitaxial MOCVD of Thin Film Ceramics for Pyroelectric Detectors

Spire proposes to deposit very thin films of lead-titanate by Metal Organic Chemical Vapor Deposition (MOCVD) for use as pyroelectric detectors. A multilayer structure will be fabricated to create an epitaxial, thermally isolated detector element with higher sensitivity than that of the thick films presently being used. MOCVD is an innovative technique which allows sequential heteroepitaxial growth of electrical and thermal insulators, electrically conducting layers, and pyroelectric materials. In Phase I, Spire will use its unique capabilities to deposit (metal)/PbTiO3/CoSi2 on silicon and will measure lead titanate's pyroelectric coefficient. Prototype infrared sensors with integrated FET's would be fabricated in Phase II. Integrated pyroelectric detector arrays made possible by this technology would have greater sensitivity and resolution arrays produced by existing hybrid fabrication processes.