SBIR/STTR Research Award

HIGH POWER MOS TRANSISTOR

Award identifier 1050850400f6b54f7e2182a080b6e4e419bd05a1f1bee0953d8ea88dfbf1c0adAwarding agency Department of Defense · Missile Defense Agency

Award amount

$60,000

Program and phase

SBIR · Phase I

Award year

1994

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Advanced Technologies/Laboratories Intl
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

The ability to control large amounts of power (1-150kW) is necessary in applications ranging from aerospace to consumer electronics to industrial power systems and transportation. In order for silicon and gallium arsenide devices to meets such high power densities, tens of devices must be combined to meet the voltage and current requirements. Power combining networks, extra heatsinking and sophisticated control electronics increase costs and decrease the efficiency of power conversion and control. By virtue of their electronic, thermal, and mechanical properties, silicon carbide semiconductors will dramatically decrease the cost and improve the efficiency of power control circuits. Critical to the implementation of SiC power devices is the ability to control the oxide/semiconductor interface.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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