SBIR/STTR Research Award

SBIR Phase I: Scratch Repair Kit for Indium Tin Oxide Coatings

Award identifier 677df495c09fa3fb868cc5feaafd0246f410239b80e1f21336bff27ae8120da9Awarding agency National Science Foundation

Award amount

$99,998

Program and phase

SBIR · Phase I

Award year

2008

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
REACTIVE INNOVATIONS, LLC
Proposal award date
Not reported
Contract end date
Not reported
UEI
NGBRMJ399F89
Solicitation number
NSF 07-551
Topic code
AM

Research abstract

This Small Business Innovation Research (SBIR) project will develop an Indium Tin Oxide (ITO) repair system for restoring the optical and electrical properties of scratched ITO-coated surfaces. These types of materials are used as electrically conducting windows which also provide protection against electromagnetic interference (EMI) in applications such as aircraft windshields and canopies, electro-optical devices, solar cells and EMI shielding.Currently there are no economical solutions to repair or rework the ITO-coated substrates scratch during the manufacturing or use in final applications. The proposed process will directly apply ITO films into the scratched areas. The research will focus on the development of process parameters, including materials, film deposition procedures, to allow the application of the novel coating technique in ambient conditions, rather than having to use high-vacuum equipment or high deposition temperatures. This will allow the technology to be used easily by technicians during manufacture, or in the field for on-site repair using a portable film application kit. The broader impacts of this technology will be ITO-coated aircraft and helicopter canopies, damaged in service due to impact by debris or other materials. This will be a major benefit for the military since the damage to the aircraft due to electromagnetic interference can be quite hazardous. Other major, high-value-added markets include electro-optical devices, such as displays, organic light-emitting diodes (OLEDs)and sensors.The new technology will permit the use of direct patterning processes used in microelectronics manufacture, thereby significantly reducing process costs. This will put the U.S. in a leadership position vis-a vis the Asian manufacturers of the electro-optical devices.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

75 SBIR/STTR records share this UEI (2001–2017). Reported award amounts total $17,192,777. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: National Aeronautics and Space Administration, Department of Defense, Department of Energy, Environmental Protection Agency, National Science Foundation, Department of Agriculture

Agency intelligence

National Science Foundation

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