SBIR/STTR Research Award

THE FABRICATION OF QUARTZ CRYSTAL RESONATORS BY ATOMIC LAYER EPITAXY

Award identifier 72e443206049acac95c2e654a980377b4e0196877528cb2111e1fe4ff24c260aAwarding agency Department of Defense · Army

Award amount

$50,000

Program and phase

SBIR · Phase I

Award year

1992

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Award details

Awarding agency
Department of Defense
Branch
Army
Recipient company
Multilayer Optics And X-ray
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

THE NEED FOR GREATER STABILITY IN QUARTZ RESONATORS REQUIRES FABRICATION TECHNIQUES THAT PRODUCE FEWER DEFECTS. THE LIMITS OF CURRENT FABRICATION TECHNIQUES TO DECREASE DEFECTS HAS BEEN REACHED. WE PROPOSED AN INNOVATIVE TECHNIQUES FOR FABRICATING DEFECT FREE QUARTZ CRYSTALS BY DEPOSITING THE QUARTZ USING ATOMIC LAYER EPITAXY (ALE). ALE IS A CHEMICAL VAPOR DEPOSITION TECHNIQUES WHICH CAN DEPOSIT A SINGLE LAYER OF QUARTZ DURING EACH CYCLE OF THE DEPOSITION PROCESS. THE TOTAL THICKNESS IS DETERMINED BY THE NUMBER OF CYCLES AND CAN BE CONTROLLED TO WITHIN ONE ATOMIC LAYER. ALE IS CURRENTLY BEING USED IN THE ELECTRONICS INDUSTRY TO DEPOSIT CRYSTALLINE SEMICONDUCTOR. WE BELIEVE THAT HIGH QUALITY CRYSTALL RESONATORS WHICH OPERATE IN GIGAHERTZ RANGE CAN BE FABRICATED USING THIS TECHNIQUE.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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