GAS JET DEPOSITION OF OPTICAL THIN FILMS FOR EXTREME ULTRA-VIOLET AND SOFT X-RAY APPLICATIONS

WE PROPOSE TO TEST A NEW TECHNIQUE, GAS JET DEPOSITION, FOR DEPOSITING SILICON CARBIDE FILMS AND GOLD-SILICON MULTILAYER FILMS FOR USE AS HIGH REFLECTANCE MIRRORS IN THE EXTREME UV AND X-RAY SPECTRAL REGIONS. SUCH MIRRORS ARE IMPORTANT TO NASA'S SPACE ASTRONOMY MISSIONS. GJD EXPLOITS SUPERSONIC GAS JETS TO DEPOSIT THIN FILMS OF METALS, SEMICONDUCTORS, INSULATORS AND ORGANICS. THE APPARATUS IS SIMPLE, EFFICIENT AND CAN DEPOSIT FILMS AT HIGH RATE ON LOW TEMPERATURE SUBSTRATES. THE OBJECTIVES OF THIS PROGRAM ARE TO LEARN IF THE PROPOSED METHOD CAN PRODUCE SIC AND AU-SI MULTILAYER FILMS AT AN ACCEPTABLE RATE, OVER USEFUL AREAS, AND WITH SUFFICIENT REFLECTANCE TO SHOW PROMISE FOR MIRROR APPLICATIONS. WE WILL DEPOSIT FILMS WITH GAS JET SOURCES MODIFIED TO SUSTAIN MICROWAVE DISCHARGES FOR PLASMA ASSISTED DEPOSITION, OR EQUIPPED WITH TARGETS FOR LASER VAPORIZATION. THE DEPOSITING FILMS WILL BE ANNEALED BY PULSED LASER HEATING AND BY BOMBARDMENT WITH HIGH FLUXES OF MODERATE ENERGY NEUTRAL SPECIES. IN ADDITION WE WILL TEST A NEW APPROACH TOCOVERAGE OF LARGE AREAS INVOLVING THE PERIODIC DEFLECTION OF THE GAS JETS. THE OPTICAL PROPERTIES OF THE FILMS WILL BE CHARACTERIZED.