SBIR/STTR Research Award

Nitride, Carbide and Non-Oxide In Situ Coatings Using RECVD,A New CVD Method

Award identifier f418451ea645e14d6d5f669b269a31d676a7c150c97b263ff943e043bc0ed185Awarding agency Department of Defense · Missile Defense Agency

Award amount

$60,000

Program and phase

SBIR · Phase I

Award year

1997

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
CCVD, Inc dba MicroCoating Technologies (MCT)
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

Currently, thermal spray (flame and plasma spray) is the only single step method of applying most metal and non-oxide ceramic coatings to large objects. These coatings are usually of a low quality, and thin films cannot be applied. An in situ deposition technique that inexpensively and easily applies nitrides, carbides and other non-oxide thin or thick films in an environmentally friendly manner is a priority for any number of commercial applications. Combustion chemical vapor deposition (CCVDsm) as invented by the principal investigator and president of MicroCoating Technologies (MCT), is a low cost, high quality deposition technique that permits the deposition of many oxygen stable materials. CVD quality films of numerous materials have been produced via CCVD in the open atmosphere without a furnace or reaction chamber, but the process is generally limited to the deposition of oxides and noble metals. A new method, termed RECVD, has been conceived that allows for the deposition of carbides, nitrides and elemental coatings in the open atmosphere. Conventional CVD uses expensive, high vapor pressure precursors to deposit these materials. In contrast, RECVD, using MCT technology developed for CCVD processing, can utilize inexpensive, environmentally safe precursors since the vapor pressure of the precursors is not a considerable concern. Low cost, production friendly RECVD will be demonstrated for the first time during Phase 1. Cr. A1N. B4C, BN, SiC, Si3N4. TiB2, TiN, TiC and Ti will be thermodynamically studied for processing, and then the capability to deposit three of these materials will be experimentally tested. This proposal will demonstrate the capability to inexpensively deposit quality metal and non-oxide ceramic thin films that cannot currently be deposited under ambient conditions. Low cost, high quality coatings that can be applied over large areas are desired for wear, strength, chemical, electrical and thermal applications. The possible commercial applications are almost as large as the thin film metal and ceramic coatings field. Numerous companies have met with MCT and are excited about non-oxide CVD coatings applied in situ. A letter from General Electric, stating their into

Technology keywords

Not reported

Agency intelligence

Department of Defense

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