SBIR/STTR Research Award

Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Award identifier 87695ec7921c518aa02b32c49c9ad171b1111224a4e288d81a632f24e7a92da9Awarding agency Department of Defense · Defense Advanced Research Projects Agency

Award amount

$99,000

Program and phase

SBIR · Phase I

Award year

2001

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Award details

Awarding agency
Department of Defense
Branch
Defense Advanced Research Projects Agency
Recipient company
Nanonex Corporation
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

Based on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offersnot only excellent uniformity of nanostructures over large areas, high-throughput (<60 sec per wafer), and scalable to 12

Technology keywords

Not reported

Agency intelligence

Department of Defense

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