SBIR Phase I: High Throughput Nanoscale Patterning with an Array of Carbon Nanotube Cold Field Emission Guns for Electron Beam Lithography

This Small Business Innovation Research Phase I project will prove the technical and commercial feasibility of a parallel electron beam (e-beam) lithography system utilizing an array of individually addressable carbon nanotube (CNT) cold field emitters. In Phase I, a 3ýý3 array of individually addressable CNT electron guns will be built and a suitable array of microcolumns will be explored. A higher throughput e-beam lithography system based on an array of electron sources will be built and characterized and is anticipated to achieve better than 10 nm patterning capability. This novel nanoelectromechanical system (NEMS) technology will enable a low cost nanoscale lithography system for general laboratory usage, thus significantly increasing the accessibility of nanoscale patterning. The work will be conducted in an Industry, University, Government collaboration and thus facilitate the transfer of knowledge amongst these entities.