SBIR/STTR Research Award
SBIR Phase II: Advanced Laser Patterning of Large Area Thin-Film Electrochromic Devices
Award amount
$497,013Program and phase
SBIR · Phase IIAward year
2006Award details
- Awarding agency
- National Science Foundation
- Branch
- Not reported
- Recipient company
- SAGE ELECTROCHROMICS,INC.
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- NSF 04-604
- Topic code
- MI
Research abstract
This Small Business Innovation Research (SBIR) Phase II project has the objective of developing and transfering to the production line laser ablation technology for the manufacture of large area thin-film electrochromic (EC) windows. Shadow masking is commonly used to pattern the electrochromic coatings on glass, but it results in unacceptable edge definition and is expensive. Laser ablation can replace masking to allow precise definition of window areas, regardless of size and shape, and has the potential to significantly reduce manufacturing costs. Broader acceptance of electrochromic windows for commercial and residential buildings will enable significant energy savings, and the laser ablation technology is applicable to non-flat shapes, which could extend use of EC windows to other applications.
Technology keywords
Not reported