SBIR/STTR Research Award
Development of Innovative Nanoimprint Lithography Tools
Award amount
$500,000Program and phase
STTR · Phase IIAward year
2002Award details
- Awarding agency
- Department of Defense
- Branch
- Defense Advanced Research Projects Agency
- Recipient company
- Nanonex Corporation
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
"The objective of the Phase II project is to further develop, complete and commercialize a unique nanoimprint lithography (NIL) machine that was designed and developed in phase I. The key personnel involved in the project are former Post-docs and graduatestudents of Prof. Chou's group, and are experts in NIL. Nanonex has received the exclusive rights on the NIL principle patent as well as other intellectual properties related NIL, therefore having a unique position in commercialization of NIL."
Technology keywords
Not reported