SUPERCONDUCTING RF CAVITY COATINGS BY MOCVD

METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) OF HIGH TEMPERATURE SUPERCONDUCTING MATERIALS HAS BEEN SHOWN TO BE FEASIBLE, BUT FILMS DEPOSITED TO DATE HAVE INFERIOR ELECTRICAL PROPERTIES COMPARED TO THE BEST REPORTED RESULTS. THE ADVANTAGES OF MOCVD TO COAT ODD SHAPES, SUCH AS THE INSIDE OF RF CAVITIES, REQUIRE IMPROVEMENT IN TECHNIQUE. THIS IS A PROPOSAL TO TEST THE FEASIBILITY OF USING MOCVD FOR PRODUCTION OF A SEED CRYSTAL LAYER DEPOSITED SLOWLY, ONE ATOMIC LAYER AT A TIME. THE BULK OF THE FILM CAN THEN BE DEPOSITED AT HIGH RATES MIXING ALL CONSTITUENTS. THIS APPROACH SHOULD PRODUCE HIGHER QUALITY YTTRIUM-BARIUM-COPPER-OXIDE FILMS WITH IMPROVEMENTS IN CRYSTAL ORIENTATION AND SURFACE QUALITY ON THE INSIDE OF A HOLLOW CYLINDRICAL RF CAVITY. RADIO FREQUENCY CHARACTERIZATION OF THE FILM FASHIONED INTO A CONVENTIONAL MICROSTRIP OSCILLATOR AND CRITICAL TEMPERATURE AND CURRENT MEASUREMENTS ON A COATED RF CAVITY WILL BE PERFORMED IN PHASE I. DESIGN AND TESTING OF A COATED RF CAVITY TO MEASURE OTHER VARIABLES RELATED TO ACCELERATOR SPECIFIC APPLICATIONS WOULD OCCUR IN PHASE II.