SBIR/STTR Research Award

Novel materials technology for high conductivity p-type AlGaN based on AlxGa(1-x)N / AlyGa(1-y)N superlattices

Award identifier 738cdd7f6621626e675702d47c4af0eaabebd36da1976a353c819cfd5eb82f82Awarding agency National Science Foundation

Award amount

$100,000

Program and phase

SBIR · Phase I

Award year

2002

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Boston Nitride Technologies, Inc.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

This Small Business Innovation Research Phase I project will develop a highly conductive p-type AlGaN by construction of AlGaN superlattices. The material p-type AlGaN is key to many optoelectronic and some electronic semiconductor devices. Many characteristics of semiconductor devices containing p-type AlGaN (that is, power efficiency, maximum power, noise properties, maximum operating temperature, heating of the device and reliability) depend on the resistivity of this layer. In this Phase I project, a novel approach for a low-resistivity p-type AlGaN is proposed, namely p-type AlxGa1-xN / AlyGa1-yN superlattices. This approach is based on exploiting potential variations induced by the superlattice and on the polarization fields occurring in the AlGaN material system. The commercial applications of this project will be in the market for electronics and optoelectronic devices. Examples of such devices include bipolar transistors, lasers, LEDs, and photodetectors

Technology keywords

Not reported

Agency intelligence

National Science Foundation

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