SBIR/STTR Research Award
Submicron-Resolution, Large-Area, High-Throughput Patterning System for Electronic Modules
Award amount
$750,000Program and phase
SBIR · Phase IIAward year
1997Award details
- Awarding agency
- Department of Defense
- Branch
- Missile Defense Agency
- Recipient company
- Anvik Corporation
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
This proposal presents a program for developing a novel patterning system technology that not only delivers submicron resolution over a large image field, but also produces high exposure throughput and eliminates the shortcomings of conventional systems. The new technology is highly attractive in the fabrication of semiconductor integrated circuits and flat-panel displays. Phase I will design a system based on the new concept and demonstrate its conceptual feasibility.
Technology keywords
Not reported