SBIR/STTR Research Award

Submicron-Resolution, Large-Area, High-Throughput Patterning System for Electronic Modules

Award identifier d36681259aeae46460797bb2af06e6e7e1dbe209cad5200adbeea825a868262bAwarding agency Department of Defense · Missile Defense Agency

Award amount

$750,000

Program and phase

SBIR · Phase II

Award year

1997

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Anvik Corporation
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

This proposal presents a program for developing a novel patterning system technology that not only delivers submicron resolution over a large image field, but also produces high exposure throughput and eliminates the shortcomings of conventional systems. The new technology is highly attractive in the fabrication of semiconductor integrated circuits and flat-panel displays. Phase I will design a system based on the new concept and demonstrate its conceptual feasibility.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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