UNSYMMETRICAL TELLURIDES AS NOVEL METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) REAGENTS FOR TELLURIUM ALLOYS

LOW GROWTH TEMPERATURES ARE ESSENTIAL FOR THE METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) OF ABRUPT HETEROJUNCTION DEVICES FABRICATED FROM MERCURY CADMIUM TELLURIDE. UNSYMMETRICAL TELLURIDES (RTER1D) REPRESENT A NOVEL ALTERNATIVE TO THE NON-OPTIMAL SOURCE REAGENTS CURRENTLY IN USE. THESE UNSYMMETRICAL TELLURIDES WILL HAVE INCREASED VOLATILITY WHILE MAINTAINING LABILE TELLURIUM-CARBON BONDS BY APPROPRIATE CHOICE OF THE R AND R1D GROUPS. THE GOAL OF THE PROPOSED RESEARCH IS TO SYNTHESIZE AND CHARACTERIZE ASERIES OF FIVE COMPOUNDS OF FORMULA RTER1D BY MODIFICATIONS OF LITERATURE PROCEDURES. THESE FIVE COMPOUNDS WILL BE PYROLYZED AND THE PRODUCTS IDENTIFIED. THE RELATIVE ROLE OF CARBON-BASED VS. TELLURIUM-BASED RADICALS ON THE DECOMPOSITION RATE AND GROWTH TEMPERATURE WILL BE STUDIED. SUCCESS IN PHASE I WILL RESULT IN THE IDENTIFICATION OF NEW, LOW TEMPERATURE SOURCE REAGENTS FOR THE MOCVD OF TELLURIUM ALLOYS.