SBIR/STTR Research Award
DEVELOPMENT OF DESIGN PARAMETERS AND CONCEPTUAL DRAWING FOR A PLASMA ETCHER TO CLEAN AND STERILIZE SURGICAL INSTRUMENTS
Award amount
$432,373Program and phase
SBIR · Phase IIAward year
1990Award details
- Awarding agency
- Department of Defense
- Branch
- Army
- Recipient company
- Ammunition Technologies Inc
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
THE PROPOSED PROCESS WILL USE ACCELERATED IONS TO REMOVE ORGANIC MATTER BY PHYSICALLY DESORBING MOLECULAR FRAGMENTS AND BY REACTING CHEMICALLY TO PRODUCE VOLATILE, NON-TOXIC GASES SUCH AS CO2. STUDIES WITH RELATED EQUIPMENT HAVE DEMONSTRATED FEASIBILITY. PHASE I RESEARCH IS TO DETERMINE THE OPTIMAL SIZE OF THE PROCESS CHAMBER AND HOW SURGICAL INSTRUMENTS CAN MOST EFFECTIVELY BE ARRANGED IN IT; THE OPTIMAL AIR PRESSURE INSIDE THE CHAMBER; THE REQUIRED POWER DENSITY; AND EVALUATE ALTERNATIVE PROCESS GENERATED BY DIRECT CURRENT, ALTERNATING CURRENT AND RADIO FREQUENCY. THE RESULT OF PHASE I WILL BE A SET OF DESIGN PARAMETERS AND A CONCEPTUAL DRAWING OF THE PROPOSED ETCHER.
Technology keywords
Not reported