SBIR/STTR Research Award

DEVELOPMENT OF DESIGN PARAMETERS AND CONCEPTUAL DRAWING FOR A PLASMA ETCHER TO CLEAN AND STERILIZE SURGICAL INSTRUMENTS

Award identifier a7b45695924e935e044b1799807fd9dfe22c605e27011fadb91f8470efb7e0f4Awarding agency Department of Defense · Army

Award amount

$432,373

Program and phase

SBIR · Phase II

Award year

1990

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Award details

Awarding agency
Department of Defense
Branch
Army
Recipient company
Ammunition Technologies Inc
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

THE PROPOSED PROCESS WILL USE ACCELERATED IONS TO REMOVE ORGANIC MATTER BY PHYSICALLY DESORBING MOLECULAR FRAGMENTS AND BY REACTING CHEMICALLY TO PRODUCE VOLATILE, NON-TOXIC GASES SUCH AS CO2. STUDIES WITH RELATED EQUIPMENT HAVE DEMONSTRATED FEASIBILITY. PHASE I RESEARCH IS TO DETERMINE THE OPTIMAL SIZE OF THE PROCESS CHAMBER AND HOW SURGICAL INSTRUMENTS CAN MOST EFFECTIVELY BE ARRANGED IN IT; THE OPTIMAL AIR PRESSURE INSIDE THE CHAMBER; THE REQUIRED POWER DENSITY; AND EVALUATE ALTERNATIVE PROCESS GENERATED BY DIRECT CURRENT, ALTERNATING CURRENT AND RADIO FREQUENCY. THE RESULT OF PHASE I WILL BE A SET OF DESIGN PARAMETERS AND A CONCEPTUAL DRAWING OF THE PROPOSED ETCHER.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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