LOW COST MULTILAYERED PZT CAPACITORS MADE USING CCVD

Combustion chemical vapor deposition (CCVD), which was invented by the principal investigator, is a high quality film deposition technique that can inexpensively and quickly apply lead zirconate-titanate (PZT) thin films in a continuos manner. This technology can be used for the production of ferroelectric capacitors. CCVD is low cost, high quality and versatile. It does not require a reaction chamber or furnace, yet the thin films produced are comparable in quality to CVD films, and CCVD technology allows substrates to be passed through a depostion zone for multilayered, production line or large area coatings. We have produced CVD quality films of numerous materials using CCVD in the open atmosphere without a furnace or reaction chamber. Thin films of PZT will be grown using CCVD, and the stoichiometry, morphology, microstructure, and electrical properties of the films will be determined as a function of deposition conditions.