Epitaxial ferroelectric thin films for electrooptic devices in the MWIR region via CCVD

"The rapid pace of development in the fields of optical telecommunications and networks over the past decade has led to an increasing demand for integrated-optic devices that are capable of processing large quantities of information more rapidly than couldbe done with conventional electronics. In the meantime, the rapid and continued growth of optical applications and devices outside the visible and communication wavelengths for both military and civil applications has also resulted in a need for opticalcontrol elements in these wavelength regions, such as in the MidWave InfraRed (MWIR) spectral region. To meet these requirements, ferroelectric thin films are being used to develop new classes of electrooptic components and devices with high opticalquality and high electrooptic coefficient. Using its innovative, high volume, low cost and open-air Combustion Chemical Vapor Deposition (CCVD) technique, MCT's proposed Phase I program is to deposit dense, epitaxial ferroelectric thin films on singlecrystal substrates for the applications of dynamic filtering of infrared lights for both military and civil purposes, and to evaluate the chemical, optical and electrooptic properties of these films. An industrial support letter is included. Tunablefilters for MidWave InfraRed Radiation are required for industrial, medical and environmental applications for materials processing, inspection, diagnostics and chemical sensing. Successful developme