SBIR/STTR Research Award

THE PROPOSED PROJECT ADDRESSES IMPROVED MASK TECHNOLOGY FOR ION BEAM LITHOGRAPHY.

Award identifier 7817a48fcaef4dd0df8ac5bc054f78e3d89015fd72accb8c01fa30a2a5f17d5aAwarding agency Department of Defense · Navy

Award amount

$69,322

Program and phase

SBIR · Phase I

Award year

1986

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Award details

Awarding agency
Department of Defense
Branch
Navy
Recipient company
Spire Corporation
Proposal award date
Not reported
Contract end date
Not reported
UEI
RG46KJGARZF4
Solicitation number
Not reported
Topic code
Not reported

Research abstract

THE PROPOSED PROJECT ADDRESSES IMPROVED MASK TECHNOLOGY FOR ION BEAM LITHOGRAPHY. SPECIFICALLY, TECHNIQUES FOR PERFECTING THE SILICON MEMBRANE USED IN SUCH MASKS ARE PRESENTED, AND RESEARCH INTENDED TO INCORPORATE SUCH TECHNIQUES IN MEMBRANE FABRICATION IS PROPOSED. IN PHASE I, THE FEASIBILITY OF BOTH IMPROVING THE CRYSTALLINE PERFECTION AND OF ALTERING THE STRESS IN THE MEMBRANES WILL BE EVALUATED. TECHNIQUES INVOLVING BOTH EPITAXY AND ION IMPLANTATION WILL BE INVESTIGATED. IN PHASE II RESEARCH ON IMPROVED MEMBRANES WILL BE CARRIED OUT. THIS RESEARCH WILL BE BASED UPON THE APPROACHES DETERMINED TO BE FEASIBLE IN PHASE I. THE MEMBRANES THUS DEVELOPED WILL BE MADE AVAILABLE TO THE INDUSTRY AS PART OF THE COMMERCIALIZATION IN PHASE III.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

429 SBIR/STTR records share this UEI (1983–2014). Reported award amounts total $73,907,551. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, National Science Foundation, Department of Energy, Department of Health and Human Services, Department of Commerce

Agency intelligence

Department of Defense

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