High Rate Depodition of Epitaxial Films for Use in Superconducting Coated Conductors

An advanced processing approach is needed to enable the ultra-fast deposition of materials for use in high temperature superconducting (HTS) tapes, needed to expand the nation¿s electricity delivery system. The result would be a rapid throughput system for 2nd generation coated conductors, which would limit production costs and help assimilate such materials into commercial use. To achieve this result, this project will investigate the deposition of superconducting films using a gas-jet assisted, electron-beam-based deposition technique that allows high quality films to be deposited at very high deposition rates. The electron beam creates dense vapor fluxes that are tailored to the size and geometry of the substrate, making highly efficient use of the evaporant. Films deposited during Phase I will focus on buffer layer chemistries that can be used to identify the conditions required for epitaxial growth. Once established, the effect of deposition rate on the epitaxial nature of the film will be studied to determine the achievable limits. Then, approaches that enable films to be deposited uniformly at high deposition rates onto substrate tapes will be determined. Commercial Applications and other Benefits as described by the awardee: High-throughput manufacturing techniques for 2nd generation coated conductors should provide more affordable superconducting tape in such applications as motors, transformers, generators, and transmission lines.