SBIR/STTR Research Award

Grating Phase Mask Technology for Cost Reduction of Optoelectronics Manufacturing

Award identifier 75f96f0386504e4a86bd40197eefae04d3c8fe9562247c7266922838d8799bfbAwarding agency Department of Defense · Defense Advanced Research Projects Agency

Award amount

$99,971

Program and phase

SBIR · Phase I

Award year

1994

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Award details

Awarding agency
Department of Defense
Branch
Defense Advanced Research Projects Agency
Recipient company
SDL Inc
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

SDL, Inc. proposes to develop a volume manufacturing technology for reducing the cost of grating-based optoelectronic devices. This technology will substantially decrease the cost of making submicro-pitch gratings, one of the most difficult and costly processing stepas in optoelectronics fabrication. As a demonstration of the technology, SDL proposed to demonstrate the new manufacturing technique. Implementation of this technology at SDL, the largest manufacturer and technology leader in commercial laser diodes, will have the largest impact on the market through cost reductions realized by the proposed program. Anticipated Benefits: Reduction of the cost of manufacturing existing optoelectronic components, providing a fabrication technology for a new generation of optoelectroni components previously not economically manufacturable, such as WDM arrays and phase-shifted DFBs.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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