SBIR/STTR Research Award
Grating Phase Mask Technology for Cost Reduction of Optoelectronics Manufacturing
Award amount
$99,971Program and phase
SBIR · Phase IAward year
1994Award details
- Awarding agency
- Department of Defense
- Branch
- Defense Advanced Research Projects Agency
- Recipient company
- SDL Inc
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
SDL, Inc. proposes to develop a volume manufacturing technology for reducing the cost of grating-based optoelectronic devices. This technology will substantially decrease the cost of making submicro-pitch gratings, one of the most difficult and costly processing stepas in optoelectronics fabrication. As a demonstration of the technology, SDL proposed to demonstrate the new manufacturing technique. Implementation of this technology at SDL, the largest manufacturer and technology leader in commercial laser diodes, will have the largest impact on the market through cost reductions realized by the proposed program. Anticipated Benefits: Reduction of the cost of manufacturing existing optoelectronic components, providing a fabrication technology for a new generation of optoelectroni components previously not economically manufacturable, such as WDM arrays and phase-shifted DFBs.
Technology keywords
Not reported