SBIR/STTR Research Award

Smart Sensors for Imaging Applications

Award identifier 86be2e057b55db361578f88a257c1076b5d3a536fe39030eca81e4d6aecd1f60Awarding agency Department of Defense · Missile Defense Agency

Award amount

$64,981

Program and phase

SBIR · Phase I

Award year

1998

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
M & D Technology Development
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

ZnO material is a wide bandgap semiconductor and a piezoelectric material as well. ZnO is compatible with current Si process technology. Large area, high quality ZnO films can be deposited by MOCVD technique on various substrates, such as sapphire and Si at low growth temperature. We propose to develop a new smart sensor technology by integration of multifunctional ZnO sensors with Si IC for imaging applications. In this Small Business Innovation Research Phase I project, we propose to grow high quality, epitaxial ZnO films on sapphire substrates using advanced MOCVD technique at low growth temperature. ZnO MSM and Schottky type of photodetectors and photodetector arrays will be fabricated and characterized. P-type doping of ZnO films using N ions will be investigated as well in proposed Phase I program. Our Phase II efforts will be focused on the smart sensors by integration of the ZnO sensor with Si IC. We plan to commercialize the ZnO smart sensors in Phase III. Low power, portable, compact, multifunctional, monolithic ZnO smart sensor arrays (integrated with Si IC) are the optimum goal of the proposed work. The success of the project will enhance US defense capability and broaden sensor commercial market.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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