SBIR/STTR Research Award

VERY-LARGE-AREA LITHOGRAPHY SYSTEM FOR FLEXIBLE DISPLAYS AND FLUIDIC-SELF-ASSEMBLY-BASED ELECTRONICS

Award identifier c1312b0c4e7370db803a7e20cdb27ec5e7423595582453c5be589bfadd83f578Awarding agency National Science Foundation

Award amount

$99,995

Program and phase

SBIR · Phase I

Award year

2002

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Anvik Corporation
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

This Small Business Innovation Research (SBIR) Phase I project addresses the manufacturing of very-large-area flexible displays. It is critical to develop a low-cost manufacturing process that enables very-large-area flexible displays to be manufactured for the military as well as the consumer. Recent technical innovations in the area of very-large-area lithography and fluidic self-assembly offer a unique process for low-cost high-volume flexible display manufacturing. Anvik Corporation has developed a breakthrough lithography technology that enables high-throughput, cost-effective production of very large displays (20 to 120 inches diagonal) on flexible substrates, which may be either loaded as discrete sheets or fed continuously in a roll-to-roll configuration. Anvil's very-large-area lithography technology represents a significant breakthrough in display manufacturing. In this proposal, we present a program for developing a production-worthy lithography system for high-throughput, low-cost fabrication of flexible, high-resolution displays of sizes up to 60-inch diagonal. This lithography process are that it is compatible with fluidic self-assembly manufacturing techniques will potentially result in higher performance and lower cost displays.

Technology keywords

Not reported

Agency intelligence

National Science Foundation

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