SBIR/STTR Research Award

GaN/AlN Based High Voltage Heterostructure Transistor

Award identifier faa92052cfcb7cf7ef8afe5a491e4bd3ecfa06ed015232c5bedfcaf604f2a5b1Awarding agency Department of Defense · Missile Defense Agency

Award amount

$84,991

Program and phase

SBIR · Phase I

Award year

1995

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Apa Optics, Inc.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

High voltage semiconductor devices have found important applications in the areas of high power generation, power control, power conversion, surge protection, and industrial electronics. However, GaAs or Si based high voltage device are limited by a relatively low intrinsic breakdown voltage and,therefore, inherently suited for high power applications. We propose to develop novel high voltage heterojunction field effect transistor device structures based on the AlGaN material system. These devices should lead to a considerably larger breakdown voltages and breakdown electric fields. Phase I will determine the material and contact issues responsible for the high field breakdown. Based on the obtained results, models and designs for high voltage GaN based devices and integrated circuits will be developed. High voltage and high power control, power conversion, surge protection, and industrial electronics that operate in adverse conditions.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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