CHEMICAL VAPOR DEPOSITION (CVD) FLUID FLOW SIMULATION MODELLING TOOL

ACCURATE SIMULATION OF PRESENT AND PROJECTED CVD PROCESSES IN CLOSED AND OPEN SYSTEMS REQUIRES SOLUTION OF TIME-DEPENDENT TRANSPORT EQUATIONS WITH GASEOUS AND SURFACE CHEMICAL REACTION RATES. PRESENT CVD MODELS ADDRESS A SUBSET OF ISSUES OF CONCERN TO VAPOR GROWTH PROCESSES AND MAINLY FOCUS ON TWO-DIMENSIONAL STEADY FLOW CONFIGURATIONS WITH IDEALIZED THERMAL BOUNDARY CONDITIONS. IT IS PROPOSED TO ENHANCE THE COMMERCIALLY EXISTING NEKTON CODE FOR CLOSED AND OPEN CVD PROCESSES. NEKTON EFFICIENTLY SOLVES THE UNSTEADY THREE-DIMENSIONAL INCOMPRESSIBLE NAVIER-STOKES EQUATIONS USING ADVANCED INTERATIVE SOLVERS AND SPECTRAL ELEMENT SPATIAL DISCRETIZATION. NEKTON ALSO USES USER-FRIENDLY MENU/GRAPHICS-BASED PRE- AND POST-PROCESSORS. UPON COMPLETION OF THIS WORK, NEKTON WILL BE CAPABLE OF SIMULTANEOUS SOLUTION OF THREE-DIMENSIONAL UNSTEADY MOMENTUM, ENERGY, AND MULTI-SPECIES CONSERVATION EQUATIONS IN DILUTE SYSTEMS, TEMPORAL TRACKING OF GENERATION AND CONSUMPTION OF REACTING SPECIES IN THE GAS AND ON THE REACTING SURFACES, AND COUPLED SOLUTION OF CONDUCTION-CONVECTION EQUATIONS IN COMPLEX THREE-DIMENSIONALGEOMETRIES WITH ROTATING BOUNDARIES (PHASE I), AND SOLUTION OF TRANSPORT EQUATIONS IN NON-DILUTE SYSTEMS, INCLUDING THE SORET EFFECT IN THE GAS AND TIME-DEPENDENT GRAVITATIONAL ACCELERATION, WITH COMPLEX SURFACE REACTION MECHANISMS IN THREE-DIMENSIONAL GEOMETRIES WITH MULTI-REACTING SURFACES (PHASE II).