SBIR/STTR Research Award

Ga, A1 N Materials and Heterostructure Device Technology

Award identifier 13d77cc7617a63feb87e0b7360c111281e66a4e688b9cec60ccd689de6c4e2e4Awarding agency Department of Defense · Air Force

Award amount

$733,363

Program and phase

SBIR · Phase II

Award year

1997

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Award details

Awarding agency
Department of Defense
Branch
Air Force
Recipient company
NZ APPLIED TECHNOLOGIES CORP.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

Wide bandgap nitride materials are emerging from a long period during which device development has hindered by inadequate materials technology. This is particularly true in the case of wide bandgap compound semiconductor devices. Historically, it has been impossible to produce wide gap III/V or II/VI materials with significant p-type conductivity. Recently, however, blue lasers have been developed in the ZnS/ZnSe materials system which can operate in pulsed mode at 300 K. Two japanese groups have also succeeded in fabricating blue LED devices from GaN. One of the groups used a unique modification of MOCVD called 'two flow' method. In the same spirit, the proposed program seeks to apply and combine the unique features of several emerging CVD techniques to promote the growth of high quality (In,Ga,Al)N Heterostructures at low temperatures.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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