SBIR/STTR Research Award

Combinatorial Approach to Improved P-Type Contacts via Optimal Molecular Doping

Award identifier 8f9a670e57fc9791e0c8434abeef8ea0c942d8da41d147cc430d9efdb54c84d4Awarding agency Department of Defense · Missile Defense Agency

Award amount

$66,609

Program and phase

STTR · Phase I

Award year

2002

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
ASTRALUX, INC.
Proposal award date
Not reported
Contract end date
Not reported
UEI
HJG2RTMJ9BE4
Solicitation number
Not reported
Topic code
Not reported

Research abstract

"Astralux, Inc. proposes to develop a novel and enabling p-type doping technology for the III-V nitrides with significant applications in the electronic and optoelectronic device arenas. Specifically, we will use molecular doping of magnesium (Mg) andoxygen (O) by ion implantation to improve upon the existing p-type doping technology, with the goal of significantly enhancing the dopant solubility, hole activation and hole mobility. Improved dopant solubility, hole activation and mobility will decreasethe resistivity of the p-doped GaN material. The optimum molecular doping concentrations and material annealing times will be determined by using the combinatorial chemistry approach. The fundamental improvements in p-doping technology, and resultantreduction of resistivity, will not only enable improved contact technology and thereby ease the fabrication of InGaN laser diodes (LDs), but also facilitate commercial development of high power microwave devices such as AlGaN/GaN HBTs. During phase I wewill unambiguously demonstrate the feasibility of the proposed technical approach. In the anticipated Phase II effort we will focus on a commercial HBT fabrication process with device demonstrations for this promising new technology. The Astralux teamincludes experts in wide bandgap materials and devices, as well as combinatorial chemistry. The material improvements expected from the outcome of this research should enable the AlGaN/GaN system to reach its full potential in electronic applications suchas heterojunction bipolar transistors (HBTs) and bibolar junction transistors (BJTs). Furthermore, improved p-type doping technology will lead to increasing the lifetimes of InGaN laser diodes and allow them to operate at lower bias voltages than ispossible today."

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

42 SBIR/STTR records share this UEI (1992–2007). Reported award amounts total $6,181,442. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Science Foundation, Department of Energy

Agency intelligence

Department of Defense

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