SBIR/STTR Research Award

High Performance Capacitor Dielectrics From Self Assembled Monolayer Based Fabrication

Award identifier 4a1543754fdbb0c77f5039fe1db5864debb54e344d43b944aee1501fbded96a4Awarding agency Department of Defense · Navy

Award amount

$69,736

Program and phase

SBIR · Phase I

Award year

1998

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Award details

Awarding agency
Department of Defense
Branch
Navy
Recipient company
Eikos, Inc.
Proposal award date
Not reported
Contract end date
Not reported
UEI
X2J1C6N7K4A6
Solicitation number
Not reported
Topic code
Not reported

Research abstract

Eikos will develop high performance capacitor dielectrics based on self-assembled monolayer buildup processing. This approach to building a capacitor dielectric will include incorporation of a graft conducting polymer as at least one of the electrodes, resulting in superior stored energy density with low dissipation factor at voltage ranges (5V to 500V) currently dominated by inefficient electrolytic capacitors. This processing technique will allow for capacitor fabrication directly onto circuit boards as well as fabrication of discrete rolled capacitors. Adoption of monolayer based dielectric assembly opens the opportunity for rapid development of new polymer dielectrics currently impeded by the lengthy and expensive process development required for traditional polymer dielectrics.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

48 SBIR/STTR records share this UEI (1997–2014). Reported award amounts total $12,797,408. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, Department of Health and Human Services, National Science Foundation, Department of Commerce

Agency intelligence

Department of Defense

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