A Scaleable Method for Fabricating Nonlinear Photonic Crystals

The University of Wisconsin has developed an MOCVD process by which micron-scale and nanoscale high contrast (air/LiNbO3) epitaxial film photonic structures can be fabricated. As a consequence of the large index difference, as well as the large secondorder optical nonlinearity of LiNbO3, very compact all-optical and electro-optic devices based on index-confined and photonic bandgap defect waveguides can be realized. These structures will serve as the basis for a new class of truly compactelectro-optic and all-optical devices and circuits. The goal of the first phase of this proposed work is to design and demonstrate a reproducible wafer-scale version of the growth process. The follow-on effort will be dedicated to the design,fabrication, and characterization of several devices, including an ultrafast traveling wave modulator, tunable resonator filter, and an all-optical logic switch. This effort will combine the unique expertise of the group of Dr. Leon McCaughan atUniversity of Wisconsin-Madison, discoverer of the technology, Structured Materials Industries, Inc., with extensive knowledge and background in oxide MOCVD processes and equipment, and Pandanus Optical Technologies, for design and fabrication of advancedoptical devices. This proposal is addressed to the expressed Air Force need for advanced nanophotonic devices and technology. Successful completion of this program will enable a breakthrough in device capability and quality for a variety of commercial andmilitary applications, including all-optical logic switches, tunable resonator filters and demultiplexers, and very low voltage traveling wave modulators - all part of a growing >$10B market